WG-16 Cleaner for Silicon Wafer

• Exceptional Cleaning Performance: Product 3 shows outstanding cleaning ability for silicon materials. It has a 99% cleaning rate for oil stains and over 99% stripping, complexing, and cleaning effect on metal ions like copper and iron.

• Environmentally Friendly: This product contains no phosphorus and is free from metal ions such as calcium, magnesium, iron, copper, and lead. It complies with EU ROHS requirements, making it an eco-friendly choice.

• High-Concentration and Low-Foam: As a high-concentration single-component product, it offers strong cleaning power with a small dosage. Moreover, it is a low-foam product, making it highly suitable for use in ultrasonic cleaning equipment.

• Improved Photovoltaic Conversion Efficiency: The content of metal ions other than potassium and sodium ions in Product 3 is not higher than 50 ppm. When used to clean silicon wafers, it can significantly improve the photoelectric conversion efficiency of the wafers.

• Semiconductor Manufacturing: Product 3 can effectively remove metal ions and oil stains on silicon wafers, ensuring the quality of semiconductor devices. It is used in processes such as wafer cleaning before etching and after chemical mechanical polishing to improve the yield and performance of semiconductor products.

• Photovoltaic Industry: Product 3 can clean silicon wafers thoroughly, reducing the impact of impurities on the performance of solar cells, thereby enhancing the overall power generation efficiency of photovoltaic modules.

• Operation Guide

    · Mixing scheme of cleaning agent: In the first tank, adjust according to the specific process requirements. Use flowing pure water for cleaning in the second tank. In the third and fourth tanks, add 4 - 6 kg of WG - 16 silicon wafer cleaning agent, and set the automatic continuous addition line to 1 - 2 kg. Use flowing pure water for cleaning in all subsequent tanks (usually 3 - 4 water - washing tanks).

    · Temperature Control: Set the temperature of the third and fourth tanks to 45 - 65°C.

    · Cleaning Time: Ensure that the cleaning time in each tank is not less than 2 minutes, and it is advisable to be 3 - 4 minutes.

    · Cleaning Agent Replacement Cycle: For manual lines, replace the cleaning agent once per shift; for automatic lines, replace it every 1 - 3 shifts.

• Precautions

    · When handling the product, wear appropriate protective equipment such as gloves and goggles to avoid contact with skin and eyes.

    · Store the product in a cool, dry place, away from direct sunlight and heat sources to ensure its stability and effectiveness.