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2832 Photoresist Cleaning Agent

2832 is a semi-aqueous photoresist cleaning agent used in chip manufacturing, designed for stripping and removing photoresist residues from sensitive substrates. It is suitable for various substrates, and has wide applications in the semiconductor industry while having no corrosion to metal parts.
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2832 is a semi-aqueous photoresist cleaning agent used in chip manufacturing, designed for stripping and removing photoresist residues from sensitive substrates. It is suitable for various substrates, and has wide applications in the semiconductor industry while having no corrosion to metal parts.


  • High Cleaning Efficiency: 2832 can rapidly and thoroughly decompose and strip various photoresists, leaving no residue, white spots, or watermarks, effectively shortening the cleaning time and reducing the defective rate.

  • Wide Applicability & Precise Selective Cleaning: 2832 applies to various types of soft materials chips and semiconductors, circuit boards, and metals cleaning. During the cleaning process, it can precisely target photoresist without causing any corrosion or latent damage to substrates and metal lines, effectively protecting the integrity and performance of the cleaned product and electronic components.

  • Excellent Rinsing Capability: Excellent Rinsing Capability: It is easy to rinse, leaving no chemical residue on the surface of the cleaned materials, and can avoid any interference with substrates and subsequent processes like deposition, etching, and such.

  • Environmentally Friendly & Safety Assurance: The product shares good water solubility, non-volatility, non-flammability, and biodegradability, meeting environmental requirements. Meanwhile, it complies with ROHS standards and can ensure safety in use.


Parameter

Value

Composition

Mixture of active agents and solvents

Appearance

Yellowish transparent fluid

PH Value

9.5-11.5

Specific Gravity

0.95-0.98

Cleaning Method

Hot soaking, spray cleaning

Packaging

25KG/plastic barrel

Storage Period

2 years


  • Ideal for removing positive/negative photoresist in LCD, LED, IC, PSS chip production processes in the semiconductor industry, as well as in PCB circuit board cleaning.

  • Dependable for cleaning colloids and resins on a variety of metal and plastic surfaces.


  • How to use: immerse the wafer or other materials that contain photoresist in this low etch photoresist cleaning agent for an appropriate time at 25 ℃ to 90 ℃.

    · The cleaning method can be hot soak treatment, spray cleaning, and other process methods.

    · The cleaning process can be operated at 25℃ to 90℃, while elevating the temperature can directly shorten the cleaning time.

    · The concentration of the cleaner can be adjusted according to the dirt level of the cleaning object, and the stock solution can be used for direct soaking for 3-10 minutes, or spray cleaning.

  • The product is non-dangerous goods and is easy to store and transport.

  • The storage period is 2 years. It cannot be stored in the open air, and should be prevented from sun and rain.

  • The barrel with unused cleaning agent should be tightened, ensuring proper storage after use to prevent impurity mixing.


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