708RB Semiconductor Wafer Particle Cleaning Agent is a water-based milky white liquid cleaner that is not only specially designed for silicon wafers, wafers, semiconductors, lithium niobate and lithium carbonate wafers, etc., but also has the function of removing fine particulate matter adsorbed on the metal surface after grinding or lapping. Moreover, when combined with ultrasonic cleaning, it can effectively strip the particulate matter adsorbed on the metal surface and has a certain descaling ability. In addition, it can target the removal of particles, organic matter, metal ions and other pollutants on the surface of these materials. What's more, the active substances in the cleaner can be adsorbed on the surface of the wafer, thus making it in a long-term easy-to-clean physical adsorption state and forming a protective layer on the surface to prevent the secondary adsorption of particles, which ultimately can effectively improve the yield rate of the epitaxial or diffusion process.

Eco-friendly and Compliant: 708RB is free of heavy metals, meeting the EU's RoHS standard. It is an environmentally friendly choice for semiconductor and wafer cleaning, ensuring compliance with international regulations.
Powerful Cleaning Performance: It shows excellent cleaning ability, effectively removing oil, dust particles, fingerprint marks, etc. The cleaning yield can reach above 99%, guaranteeing high-quality cleaning results.
Low-foam and Residue-free: With low foam, it is easy to rinse and leaves no residue. This feature simplifies the post-cleaning process and ensures the cleanliness of the cleaned items.
Direct and Convenient Operation: It allows direct cleaning, saving time and effort. The easy operation and replacement make it a convenient choice for various cleaning applications.
Excellent Physical Adsorption: The active substances enable long-term physical adsorption, keeping the surface in an easily cleanable state and preventing secondary particle adsorption.

Parameter	Unit	Data
Appearance (Original Solution)	-	Milky-white liquid
Appearance (Diluted Solution)	-	Transparent liquid
Odor	-	None
Pour Point	℃	2
Density	kg/m³	1030
pH Value (5%)	-	12 (about 9.5 after dilution)

Semiconductor Industry: 708RB is widely applicable in the semiconductor industry. It is used for the precise cleaning of semiconductor chips and wafers, including silicon wafers, lithium niobate wafers, etc. By effectively removing various contaminants, it ensures the integrity and performance of semiconductor components, which is crucial for the production of high-quality semiconductor devices.
Component Cleaning: In the manufacturing and maintenance of electronic components, this cleaner plays a vital role. It can thoroughly clean the surfaces of components, eliminating particles, organic substances, and metal ions that may affect the functionality and reliability of the components. This is especially important for components used in high-precision electronic equipment.
Thin Film Technology: For glass and metal surfaces in thin film technology, 708RB is an ideal choice. It helps to prepare the surfaces by removing impurities, enabling better adhesion and quality of the thin films. Whether it is for optical coatings or other thin film applications, it ensures a clean and suitable surface for the deposition process.

Usage：
· Dilution: For ultrasonic cleaning, it is recommended to dilute with water at a ratio of 1:20 - 1:50.

· Temperature Setting: Set the temperature between 30 - 60°C.

· Cleaning time: approx. 30 minutes. Adjust according to the actual situation.

· Mixing: Mix the detergent and water in the same proportion, heat to the set temperature and start cleaning.

· Maintenance: Check and replenish the cleaning agent regularly. Check the purified water and filter cartridges of the cleaning equipment.

· Replace the cleaning agent every 1 - 3 days for normal use and once a day for heavy cleaning (no more than 5 days).

· For example, in the first tank, dilute 1:30 and ultrasonic at 40HZ for 20 minutes at 35°C; in the second tank, dilute 1:50 and ultrasonic at 40HZ for 30 minutes at 30°C.

Storage：
· The product complies with EU ROHS standard.
· Plastic drum package: 5KG,10KG,25KG/drum, non-dangerous goods easy to store and transport.
· The storage period is two years, it cannot be stored in the open air, and prevented from the sun and rain.
· The unused cleaner should be tightly screwed on the lid of the drum to avoid moisture and impurity mixing.

708RB Semiconductor Wafer Particle Cleaning Agent

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